Gallium arsenide GaAs
GaAs, one gallium atom bonded to one arsenic atom (zinc-blende crystal) · CAS 1303-00-0 · Td2-F43m (zinc blende)
Gallium arsenide is a compound semiconductor, one gallium atom bonded to one arsenic atom, with a zinc-blende crystal.
Evidence level
2 of 5
Lab-measured
- 0Predicted only. No one has made it, or no measurement exists.
- 1Calculated. Only calculated or predicted values from sources.
- 2Lab-measured. Measured properties with their conditions stated.
- 3Space-relevant tests. Measured in conditions relevant to space, such as vacuum or atomic oxygen.
- 4Ground-qualified. Qualified for an application on the ground.
- 5Flown or field-proven. Flight or field results exist.
Carry electrons fast
8500
Absorb and emit at a wide band gap
1.424
Hold up in orbit, with a cost
30
Recipe, share of the weight
- Ga 48.2%Gallium
- As 51.8%Arsenic
Best for
Light emission, RF power and multijunction space solar cells, where the band gap and electron mobility of GaAs beat silicon (1.424 eV and up to 8500 cm2/(V·s))
Weakest at
Cost and toxicity: the arsenic content is classed as carcinogenic in GHS, and the gallium supply is concentrated in China (99% of primary low-purity gallium)
Risk at a glance
- People Moderate. Hazardous, carcinogenic
- If it fails High. Arsine formation
- Corrosion Severe. Can release arsine, and cold concentrated hydrochloric acid attacks it
Quick facts: GaAs
| Property | Value | Basis |
|---|---|---|
| Density | 5.32 g/cm³ | 3 sourced values across conditions |
| Thermal conductivity | 46 to 55 W/(m·K) | 2 sourced values across conditions |
| Thermal expansion (CTE) | 5.73 to 6.86 ppm/K | 2 sourced values across conditions |
| Melting point | 1,238 to 1,240 °C | 2 sourced values across conditions |
| Specific heat | 330 to 350 J/(kg·K) | 2 sourced values across conditions |
| Electrical resistivity | 3,300,000 Ω·m | 1 sourced value |
What is the density of Gallium arsenide (GaAs)?
Gallium arsenide (GaAs) has a density of 5.32 g/cm³. The range covers 3 sourced values across the tempers, forms and test conditions the sources report; room-temperature values are used where a source states a temperature.
What is the thermal conductivity of Gallium arsenide (GaAs)?
Gallium arsenide (GaAs) has a thermal conductivity of 46 to 55 W/(m·K). The range covers 2 sourced values across the tempers, forms and test conditions the sources report; room-temperature values are used where a source states a temperature.
What is the coefficient of thermal expansion of Gallium arsenide (GaAs)?
Gallium arsenide (GaAs) has a coefficient of thermal expansion of 5.73 to 6.86 ppm/K. The range covers 2 sourced values across the tempers, forms and test conditions the sources report; room-temperature values are used where a source states a temperature.
What is the melting point of Gallium arsenide (GaAs)?
Gallium arsenide (GaAs) has a melting point of 1,238 to 1,240 °C. The range covers 2 sourced values across the tempers, forms and test conditions the sources report; room-temperature values are used where a source states a temperature.
What is Gallium arsenide (GaAs) used for?
Uses recorded in the sources include Triple-junction space solar cell (GaInP/GaAs/Ge); Power amplifier in cellular handsets; Laser diodes, LEDs and photodetectors.
Why it exists
Gallium arsenide is the compound semiconductor used in multijunction space solar cells and in RF power amplifiers for cellular handsets. The sources read give a band gap of 1.424 eV at 300 K, electron mobility up to 8500 cm2/(V·s), and a melting point of 1238 to 1240 °C. Its arsenic content sets the hazard profile.
Where it's used
Space solar cells
Spectrolab's space solar cells use a GaInP/GaAs/Ge multijunction design, and the paper reports efficiencies of 21.5% (dual junction, 1997), 25.1% (triple junction) and over 28.3% (ultra-triple junction, AM0). It states that the design powers GEO missions up to a possible 30 kW on a single satellite.
Cellular handset RF amplifiers
USGS says GaAs power amplifiers are used in cellular handsets, and that silicon CMOS power amplifiers compete with them in midtier 3G handsets.
Optoelectronics and defence
USGS lists GaAs as the material for compound semiconductor wafers used in integrated circuits and optoelectronic devices, including laser diodes, LEDs, photodetectors and solar cells, and says GaAs and GaN ICs have no effective substitutes in many defence applications.
Recipe
GaAs, one gallium atom bonded to one arsenic atom (zinc-blende crystal)
GaAs is a compound of one gallium atom and one arsenic atom in a 1:1 ratio, forming a zinc-blende crystal. Each element's standard atomic weight is taken from NIST. The composition is fixed by stoichiometry, not by a recipe with process steps read in this run.
| Ingredient | Atoms per unit | Share of the weight | What it does |
|---|---|---|---|
| Gallium Ga | 1 | 48.2% | The group III element. Gallium supplies the metal sites of the zinc-blende lattice, and its supply is concentrated in China. |
| Arsenic As | 1 | 51.8% | The group V element. Arsenic occupies the other sublattice, and it is the main source of the substance's toxicity. |
Weight shares are calculated from standard atomic weights.
What it can do
Carry electrons fast
8500
measured
Electron drift mobility is 8500 cm2/(V·s) at 300 K in eesemi's table, which lists a lower value for silicon in the same table.
Absorb and emit at a wide band gap
1.424
measured
The band gap is 1.424 eV at 300 K in two sources, which sits above silicon's value in the same table and suits photon emission and multijunction cells.
Hold up in orbit, with a cost
30
At 150 keV the maximum-power damage coefficient is 30 times silicon's. The study still judged GaAs cells to perform well in proton-dominated orbits.
How it compares
Gallium arsenide has higher electron mobility and a wider band gap than silicon at 300 K, and a lower melting point and thermal conductivity. Under low-energy proton irradiation the 1984 JPL study found GaAs cells lost much more power than silicon cells, while the authors judged GaAs cells to perform well in proton-dominated orbits.
The same measurements for each material, so you can compare them. Each row names the key condition under the value; the full conditions and methods are in the numbered notes under Technical details. Compare every grade in the family.
| Measurement | GaAs |
|---|---|
| Thermal behavior and safety | |
| Melting pointValue printed in a materials property table | 1240 °C |
| Melting point (table at 300 K)Value printed in a materials property table | 1238 °C |
| Thermal conductivityValue printed in a materials property table | 0.46 W/(cm·°C) |
| Thermal conductivity (no temperature stated)Value printed in a materials property table | 0.55 W/(cm·°C) |
| Specific heat (table at 300 K)Value printed in a materials property table | 0.35 J/(g·°C) |
| Specific heat (no temperature stated)Value printed in a materials property table | 0.33 J/(g·°C) |
| Physical and electrical | |
| DensityValue printed in a materials property table | 5.32 g/cm³ |
| Density (mechanical properties table)Value printed in a materials property table | 5.317 g/cm³ |
| Density (table at 300 K)Value printed in a materials property table | 5.32 g/cm³ |
| Intrinsic resistivityValue printed in a materials property table | 3.3×10^8 Ω·cm |
| Other measurements | |
| Lattice constantValue printed in a materials property table | 5.653 Å |
| Lattice constant (table at 300 K)Value printed in a materials property table | 5.653 angstrom |
| Energy band gap at 300 KValue printed in a materials property table | 1.424 eV |
| Energy band gap at 300 K (table)Value printed in a materials property table | 1.424 eV |
| Electron drift mobilityValue printed in a materials property table | 8500 cm²/(V·s) |
| Electron mobility (upper limit for weakly doped material)Value printed in a materials property table | 8500 cm² V-1 s-1 |
| Hole drift mobilityValue printed in a materials property table | 400 cm²/(V·s) |
| Linear thermal expansion (table at 300 K)Value printed in a materials property table | 6.86×10^-6 1/°C |
| Linear thermal expansion (no temperature stated)Value printed in a materials property table | 5.73×10^-6 1/°C |
| Dielectric constant (static)Value printed in a materials property table | 12.9 dimensionless |
| Dielectric constant (table at 300 K)Value printed in a materials property table | 13.1 dimensionless |
| Bulk modulusValue printed in a materials property table | 7.53×10^11 dyn/cm² |
| Poisson ratioValue printed in a materials property table | 0.31 dimensionless |
| Intrinsic carrier concentration (table at 300 K)Value printed in a materials property table | 1.79×10^6 cm-3 |
| Intrinsic carrier concentration (band structure page)Value printed in a materials property table | 2.1×10^6 cm-3 |
| Infrared refractive indexValue printed in a materials property table | 3.3 dimensionless |
| Electron affinityValue printed in a materials property table | 4.07 eV |
| Breakdown fieldValue printed in a materials property table | 4×10^5 V/cm |
Why choose it, and why not
Good for
- label: High-efficiency space solar cells line: The GaInP/GaAs/Ge multijunction design reached 25.1% efficiency for the triple junction and over 28.3% for the ultra-triple junction, and the paper says it powers GEO satellites.
- label: High electron mobility devices line: The 8500 cm2/(V·s) electron mobility and 1.424 eV band gap make GaAs a standard choice for RF power amplifiers and optoelectronic devices, as USGS describes.
Watch out for
- label: Arsenic content line: GHS classes GaAs as carcinogenic and toxic to reproduction, and the arsenic it contains is the cause, so handling is controlled.
- label: Radiation in orbit line: The JPL study found GaAs cells lost 30% of their short-circuit current and about 40% of maximum power under 50 keV protons, and it reported damage coefficients 30 times silicon's at 150 keV.
- label: Supply concentration line: China produced 99% of primary low-purity gallium and supplied more than 90% of US arsenic metal imports, and its export controls on gallium, first imposed in the recent past and partly lifted, have affected US supply (USGS).
Gallium arsenide is well documented. Its band gap, mobility, density and melting point agree across two or more sources, and its space cell efficiencies come from a manufacturer. Its hazard data are from PubChem and its radiation data from a 1984 study, so both are dated or secondary. Supply is concentrated in China.
Technical details
For scientists and researchers. Everything above comes from the record below: every number with its method, its conditions and its source.
Cell-level benchmarks
Values for finished cells. These vary by manufacturer, so read the conditions in the notes. Compare every grade in the family.
| Measurement | GaAs |
|---|---|
| Other measurements | |
| Efficiency, GaInP/GaAs/Ge ultra-triple-junction (max power, AM0) | 28.3 %1 |
| Efficiency, GaInP/GaAs/Ge triple junction (on orbit since 2001, beginning of life) | 25.1 %2 |
| Efficiency, dual-junction GaInP/GaAs (first commercial satellite, 1997, beginning of life) | 21.5 %3 |
| Maximum power loss, GaAs cells under 50 keV protons | 40 %4 |
| Short-circuit current loss, GaAs cells under 50 keV protons | 30 %5 |
| Maximum-power damage coefficient, GaAs relative to silicon, 150 keV protons | 30 x silicon6 |
Notes
The method, full conditions and any caveat for the numbered rows above.
| # | Measurement | Method | Conditions | Caveat |
|---|---|---|---|---|
| 1 | Efficiency, GaInP/GaAs/Ge ultra-triple-junction (max power, AM0) | Value printed in a conference paper by the manufacturer | device GaInP/GaAs/Ge multijunction (GaAs is the middle junction)illumination AM0, 135.3 mW/cm2, 28 °Cbasis highest power device, printed as over 28.3% | — |
| 2 | Efficiency, GaInP/GaAs/Ge triple junction (on orbit since 2001, beginning of life) | Value printed in a conference paper by the manufacturer | device GaInP/GaAs/Ge triple junction (TJ)illumination AM0basis beginning of life, printed in the paper | — |
| 3 | Efficiency, dual-junction GaInP/GaAs (first commercial satellite, 1997, beginning of life) | Value printed in a conference paper by the manufacturer | device GaInP/GaAs dual junction (DJ)illumination AM0basis beginning of life, printed in the paper | — |
| 4 | Maximum power loss, GaAs cells under 50 keV protons | Experimental irradiation of LPE p/n GaAs cells, reported in the JPL study | particle protons, 50 keVbasis approximately 40% loss as printed; the report does not give the fluence in the passage read | — |
| 5 | Short-circuit current loss, GaAs cells under 50 keV protons | Experimental irradiation of LPE p/n GaAs cells, reported in the JPL study | particle protons, 50 keVbasis printed as 30% of initial Isc | — |
| 6 | Maximum-power damage coefficient, GaAs relative to silicon, 150 keV protons | Derived damage coefficients from proton irradiation, relative to 10 MeV protons | particle protons, 150 keVincidence normalbasis printed as a factor of 30 higher than for silicon at 150 keV | — |
Corrosion and compatibility
What happens when it meets other materials and environments.
| Environment | Concern | What happens |
|---|---|---|
| Moist air at room temperature | low | Stable in dry air and tarnishes in moist air (PubChem)1 |
| Steam, acids and acid fumes | severe | Can release arsine, and cold concentrated hydrochloric acid attacks it2 |
| Proton radiation in orbit | severe | Power loss under 50 keV protons; silicon cells did not lose short-circuit current in the same study3 |
| # | Environment | Details | Test conditions |
|---|---|---|---|
| 1 | Moist air at room temperature | PubChem's stability entry says GaAs is stable in dry air and tarnishes in moist air. It is insoluble in water. | exposure moist air, duration and temperature not stated in the entry |
| 2 | Steam, acids and acid fumes | PubChem says GaAs reacts with steam, acids and acid fumes to evolve arsine. It is attacked by cold concentrated hydrochloric acid and readily attacked by the halogens. | exposure contact with steam or acids, concentration not stated |
| 3 | Proton radiation in orbit | Under 50 keV protons GaAs cells lost 30% of their short-circuit current, 10% of open-circuit voltage and about 40% of maximum power. The study notes silicon cells did not lose short-circuit current at low proton energy. | particle protons, 50 keVcell LPE p/n GaAs solar cells |
Risks and side effects
Hazards to people, what happens when a cell overheats, and how the material is handled and stored.
For people
PubChem's GHS entry for GaAs (CAS 1303-00-0) carries carcinogen, reproductive and organ-damage hazard statements, and its toxicity is attributed to the arsenic it contains.
- GHS statements
- H350 (may cause cancer), H360F (may damage fertility) and H372 (causes damage to organs through prolonged or repeated exposure), H350 and H372 each in 88.4% of the company reports and H360 in 50.9%, with 6.2% (7 of 112) reporting no hazard.
- Exposure limits
- NIOSH gives a 15-minute ceiling for inorganic arsenic compounds, OSHA an 8-hour limit as As, and ACGIH lists arsenic and inorganic compounds as A1, a confirmed human carcinogen (see the mitigations entry for the figures).
If it fails
Reactions with steam, acids and acid fumes can release arsine, a highly toxic gas.
- Arsine
- PubChem says GaAs can react with steam, acids and acid fumes to evolve the deadly poisonous arsine, and that molten GaAs attacks quartz.
Handling and storage
The sources read give storage advice for arsenic compounds generally, which applies to GaAs.
- Storage
- PubChem's advice for inorganic arsenic compounds: store in a well-ventilated area away from food and combustible materials, and protect the container from physical damage.
Test details
The original wording and numbers from the sources, for readers who want them.
Failure risks
| Failure | Trigger and consequence |
|---|---|
| Arsine formationhigh severity | Contact with steam, acids or acid fumesPubChem says GaAs can evolve the deadly poisonous gas arsine. |
Handling and storage
- Store under ambient temperatures in a well-ventilated area away from food and combustible materials, and protect containers from physical damage (PubChem, inorganic arsenic compounds).
Mitigations
- Use local exhaust ventilation and, where the arsenic exposure limit may be exceeded, respiratory protection (PubChem, arsenic compounds). Limits as printed: NIOSH recommended 15-minute ceiling 0.002 mg/m3 (as As); OSHA permissible exposure 8-hour TWA 0.01 mg/m3 (as As); ACGIH TLV-TWA 0.0003 mg/m3, respirable fraction.
Supply and geography
How common the raw materials are and where they come from.
Gallium
Gallium occurs in very small concentrations in other metal ores. The average gallium content of bauxite is 50 parts per million, and most gallium is recovered from bauxite processing (USGS)
- Top producers (2025)
- China 99%
- Recycling
- New scrap from GaAs device manufacture was reprocessed to recover high-purity gallium at one New York facility. No old scrap was recycled (USGS 2026).
Gallium arsenide wafers
US imports of GaAs wafers were estimated at 110,000 kg gross weight in 2025, with a value of about 120 million dollars (USGS 2026)
- Recycling
- Substantial quantities of new scrap from GaAs device manufacture were reprocessed (USGS 2026).
Arsenic
Arsenic is obtained mainly from copper, gold and lead smelter flue dust, and from roasting of ores (USGS 2026). World reserves are estimated at more than 20 times world production. China supplied 95% of US arsenic metal imports in 2021 to 2024, which is an import share, not a producer share.
- Recycling
- Arsenic metal was contained in new scrap recycled during GaAs semiconductor manufacturing (USGS 2026).
Documents
Datasheets, safety data sheets, papers and standards you can open.
Full record
The complete spore, as stored. Free to reuse under CC-BY-4.0. Images keep the licence shown with each one.
Show the full YAML
spore: profile
id: gallium-arsenide
spore_version: 0.2
family: semiconductor-materials
name: Gallium arsenide
abbreviation: GaAs
role: semiconductor
category: semiconductors
type: gaas
summary: |
Gallium arsenide is a compound semiconductor, one gallium atom bonded to one arsenic atom, with a zinc-blende crystal. The sources read for this profile give a band gap of 1.424 eV at 300 K, electron mobility up to 8500 cm2/(V·s), and a density of 5.32 g/cm3. Spectrolab's space solar cells use GaAs-based multijunction designs, and a 1984 JPL study found GaAs cells lost much more power than silicon cells under 50 keV protons, though its authors judged GaAs cells to perform well in proton-dominated orbits.
best_for: Light emission, RF power and multijunction space solar cells, where the band gap and electron mobility of GaAs beat silicon (1.424 eV and up to 8500 cm2/(V·s))
weakest_at: 'Cost and toxicity: the arsenic content is classed as carcinogenic in GHS, and the gallium supply is concentrated in China (99% of primary low-purity gallium)'
identity:
formula: GaAs, one gallium atom bonded to one arsenic atom (zinc-blende crystal)
cas: 1303-00-0
space_group: Td2-F43m (zinc blende)
source: ioffe-basic
where: Basic Parameters at 300 K table (crystal structure, group of symmetry); CAS from NIST WebBook (Chemistry WebBook, formula AsGa, CAS Registry Number 1303-00-0)
tags:
environments:
- geo
stresses: []
applications:
- solar-arrays
- electronics-and-chips
- optics-and-cameras
properties:
- benchmark: density
label: Density
value: 5.32
unit: g/cm3
scope: material
conditions:
temperature: 300 K (table title)
method: Value printed in a materials property table
status: ground
source: ioffe-basic
where: Basic Parameters at 300 K table, row Density
- benchmark: density
label: Density (mechanical properties table)
value: 5.317
unit: g/cm3
scope: material
conditions:
temperature: not stated on the page
method: Value printed in a materials property table
status: ground
source: ioffe-mechanic
where: Mechanical properties table, Basic Parameter block, row Density
- benchmark: density
label: Density (table at 300 K)
value: 5.32
unit: g/cm3
scope: material
conditions:
temperature: 300 K (table title)
method: Value printed in a materials property table
status: ground
source: eesemi
where: Table at 300 deg K, column GaAs, row Density (g/cm3)
- benchmark: lattice_constant
label: Lattice constant
value: 5.65325
unit: Å
scope: material
conditions:
temperature: 300 K (table title)
method: Value printed in a materials property table
status: ground
source: ioffe-basic
where: Basic Parameters at 300 K table, row Lattice constant (printed as 5.65325 A)
- benchmark: lattice_constant
label: Lattice constant (table at 300 K)
value: 5.6533
unit: angstrom
scope: material
conditions:
temperature: 300 K (table title)
method: Value printed in a materials property table
status: ground
source: eesemi
where: Table at 300 deg K, column GaAs, row Lattice Constant (angstroms)
- benchmark: melting_point
label: Melting point
value: 1240
unit: °C
scope: material
conditions:
basis: melting point as printed, no pressure stated
method: Value printed in a materials property table
status: ground
source: ioffe-thermal
where: Thermal properties table, row Melting point
- benchmark: melting_point
label: Melting point (table at 300 K)
value: 1238
unit: °C
scope: material
conditions:
basis: melting point as printed, no pressure stated
method: Value printed in a materials property table
status: ground
source: eesemi
where: Table at 300 deg K, column GaAs, row Melting Point (deg C)
- benchmark: bandgap
label: Energy band gap at 300 K
value: 1.424
unit: eV
scope: material
conditions:
temperature: 300 K
method: Value printed in a materials property table
status: ground
source: ioffe-bandstr
where: Band structure and carrier concentration page, Basic Parameters block, row Energy gap (also printed as Eg = 1.42 eV in the band structure figure)
- benchmark: bandgap
label: Energy band gap at 300 K (table)
value: 1.424
unit: eV
scope: material
conditions:
temperature: 300 K (table title)
method: Value printed in a materials property table
status: ground
source: eesemi
where: Table at 300 deg K, column GaAs, row Energy Gap at 300K (eV)
- benchmark: electron_mobility
label: Electron drift mobility
value: 8500
unit: cm2/(V·s)
scope: material
conditions:
temperature: 300 K (table title)
type: drift mobility, doping not stated
method: Value printed in a materials property table
status: ground
source: eesemi
where: Table at 300 deg K, column GaAs, row Mobility (Drift) n, electrons
- benchmark: electron_mobility
label: Electron mobility (upper limit for weakly doped material)
value: 8500
unit: cm2 V-1 s-1
scope: material
conditions:
temperature: not stated on the page
basis: printed as "≤8500", so this is an upper value
method: Value printed in a materials property table
status: ground
source: ioffe-electric
where: Electrical properties, Basic Parameters block, row Mobility electrons
- benchmark: hole_mobility
label: Hole drift mobility
value: 400
unit: cm2/(V·s)
scope: material
conditions:
temperature: 300 K (table title)
type: drift mobility, doping not stated
method: Value printed in a materials property table
status: ground
source: eesemi
where: Table at 300 deg K, column GaAs, row Mobility (Drift) p, holes
- benchmark: thermal_conductivity
label: Thermal conductivity
value: 0.46
unit: W/(cm·°C)
scope: material
conditions:
temperature: 300 K (table title)
method: Value printed in a materials property table
status: ground
source: eesemi
where: Table at 300 deg K, column GaAs, row Thermal Conductivity at 300 K
- benchmark: thermal_conductivity
label: Thermal conductivity (no temperature stated)
value: 0.55
unit: W/(cm·°C)
scope: material
conditions:
temperature: not stated on the page
method: Value printed in a materials property table
status: ground
source: ioffe-thermal
where: Thermal properties table, row Thermal conductivity
- benchmark: specific_heat
label: Specific heat (table at 300 K)
value: 0.35
unit: J/(g·°C)
scope: material
conditions:
temperature: 300 K (table title)
method: Value printed in a materials property table
status: ground
source: eesemi
where: Table at 300 deg K, column GaAs, row Specific Heat (J/g-deg C)
- benchmark: specific_heat
label: Specific heat (no temperature stated)
value: 0.33
unit: J/(g·°C)
scope: material
conditions:
temperature: not stated on the page
method: Value printed in a materials property table
status: ground
source: ioffe-thermal
where: Thermal properties table, row Specific heat (printed as J g-1°C -1)
- benchmark: cte
label: Linear thermal expansion (table at 300 K)
value: 0.00000686
unit: 1/°C
scope: material
conditions:
temperature: 300 K (table title)
method: Value printed in a materials property table
status: ground
source: eesemi
where: Table at 300 deg K, column GaAs, row Linear Coefficient of Thermal Expansion (printed as 6.86 x 10-6)
- benchmark: cte
label: Linear thermal expansion (no temperature stated)
value: 0.00000573
unit: 1/°C
scope: material
conditions:
temperature: not stated on the page
method: Value printed in a materials property table
status: ground
source: ioffe-thermal
where: Thermal properties table, row Thermal expansion, linear (printed as 5.73·10-6)
- benchmark: dielectric_constant
label: Dielectric constant (static)
value: 12.9
unit: dimensionless
scope: material
conditions:
frequency: static
temperature: 300 K (table title)
method: Value printed in a materials property table
status: ground
source: ioffe-basic
where: Basic Parameters at 300 K table, row Dielectric constant (static)
- benchmark: dielectric_constant
label: Dielectric constant (table at 300 K)
value: 13.1
unit: dimensionless
scope: material
conditions:
temperature: 300 K (table title)
method: Value printed in a materials property table
status: ground
source: eesemi
where: Table at 300 deg K, column GaAs, row Dielectric Constant
- benchmark: bulk_modulus
label: Bulk modulus
value: 753000000000
unit: dyn/cm2
scope: material
conditions:
temperature: not stated on the page
method: Value printed in a materials property table
status: ground
source: ioffe-mechanic
where: Mechanical properties table, Basic Parameter block, row Bulk modulus (printed as 7.53·10^11 dyn cm-2)
- benchmark: poissons_ratio
label: Poisson ratio
value: 0.31
unit: dimensionless
scope: material
conditions:
temperature: 300 K
direction: '100'
method: Value printed in a materials property table
status: ground
source: ioffe-mechanic
where: Elastic constants block at 300 K, row [100] Poisson ratio
- benchmark: intrinsic_carrier_concentration
label: Intrinsic carrier concentration (table at 300 K)
value: 1790000
unit: cm-3
scope: material
conditions:
temperature: 300 K (table title)
method: Value printed in a materials property table
status: ground
source: eesemi
where: Table at 300 deg K, column GaAs, row Intrinsic Carrier Concentration (printed as 1.79 x 10^6)
- benchmark: intrinsic_carrier_concentration
label: Intrinsic carrier concentration (band structure page)
value: 2100000
unit: cm-3
scope: material
conditions:
temperature: 300 K
method: Value printed in a materials property table
status: ground
source: ioffe-bandstr
where: Band structure page, Basic Parameters block, row Intrinsic carrier concentration (printed as 2.1·10^6)
- benchmark: electrical_resistivity
label: Intrinsic resistivity
value: 330000000
unit: Ω·cm
scope: material
conditions:
temperature: 300 K
doping: intrinsic
method: Value printed in a materials property table
status: ground
source: ioffe-bandstr
where: Band structure page, Basic Parameters block, row Intrinsic resistivity (printed as 3.3·10^8)
- benchmark: refractive_index
label: Infrared refractive index
value: 3.3
unit: dimensionless
scope: material
conditions:
temperature: 300 K
wavelength: infrared (wavelength not stated in the table row)
method: Value printed in a materials property table
status: ground
source: ioffe-optic
where: Optical properties page, row Infrared refractive index (formula gives n = 3.299 at 300 K)
- benchmark: electron_affinity
label: Electron affinity
value: 4.07
unit: eV
scope: material
conditions:
temperature: 300 K (table title)
method: Value printed in a materials property table
status: ground
source: ioffe-basic
where: Basic Parameters at 300 K table, row Electron affinity
- benchmark: breakdown_field
label: Breakdown field
value: 400000
unit: V/cm
scope: material
conditions:
basis: printed as approximately 4·10^5 V/cm
method: Value printed in a materials property table
status: ground
source: ioffe-electric
where: Electrical properties, Basic Parameters block, row Breakdown field
- benchmark: efficiency_am0
label: Efficiency, GaInP/GaAs/Ge ultra-triple-junction (max power, AM0)
value: 28.3
unit: '%'
scope: cell
conditions:
device: GaInP/GaAs/Ge multijunction (GaAs is the middle junction)
illumination: AM0, 135.3 mW/cm2, 28 °C
basis: highest power device, printed as over 28.3%
method: Value printed in a conference paper by the manufacturer
status: ground
source: spectrolab-nasa
where: Introduction, paragraph on the Ultra-Triple Junction (UTJ) product
- benchmark: efficiency_am0
label: Efficiency, GaInP/GaAs/Ge triple junction (on orbit since 2001, beginning of life)
value: 25.1
unit: '%'
scope: cell
conditions:
device: GaInP/GaAs/Ge triple junction (TJ)
illumination: AM0
basis: beginning of life, printed in the paper
method: Value printed in a conference paper by the manufacturer
status: ground
source: spectrolab-nasa
where: Introduction, paragraph on the Triple Junction (TJ) product line
- benchmark: efficiency_am0
label: Efficiency, dual-junction GaInP/GaAs (first commercial satellite, 1997, beginning of life)
value: 21.5
unit: '%'
scope: cell
conditions:
device: GaInP/GaAs dual junction (DJ)
illumination: AM0
basis: beginning of life, printed in the paper
method: Value printed in a conference paper by the manufacturer
status: ground
source: spectrolab-nasa
where: Introduction, paragraph on the first commercial multijunction satellite (Hughes HS 601HP, 1997)
- benchmark: maximum_power_loss
label: Maximum power loss, GaAs cells under 50 keV protons
value: 40
unit: '%'
scope: cell
conditions:
particle: protons, 50 keV
basis: approximately 40% loss as printed; the report does not give the fluence in the passage read
method: Experimental irradiation of LPE p/n GaAs cells, reported in the JPL study
status: ground
source: nasa-jpl-84-61
where: Section on GaAs cell results, 50 keV proton bombardment paragraph
- benchmark: short_circuit_current_loss
label: Short-circuit current loss, GaAs cells under 50 keV protons
value: 30
unit: '%'
scope: cell
conditions:
particle: protons, 50 keV
basis: printed as 30% of initial Isc
method: Experimental irradiation of LPE p/n GaAs cells, reported in the JPL study
status: ground
source: nasa-jpl-84-61
where: Section on GaAs cell results, 50 keV proton bombardment paragraph (silicon cells did not lose Isc at low proton energy in the same study)
- benchmark: damage_coefficient_ratio
label: Maximum-power damage coefficient, GaAs relative to silicon, 150 keV protons
value: 30
unit: x silicon
scope: cell
conditions:
particle: protons, 150 keV
incidence: normal
basis: printed as a factor of 30 higher than for silicon at 150 keV
method: Derived damage coefficients from proton irradiation, relative to 10 MeV protons
status: ground
source: nasa-jpl-84-61
where: Discussion of normal-incidence Pm damage coefficients, Figure 30 text
story:
recipe:
line: |
GaAs is a compound of one gallium atom and one arsenic atom in a 1:1 ratio, forming a zinc-blende crystal. Each element's standard atomic weight is taken from NIST. The composition is fixed by stoichiometry, not by a recipe with process steps read in this run.
parts:
- name: Gallium
symbol: Ga
atoms: 1
atomic_weight: 69.723
role: The group III element. Gallium supplies the metal sites of the zinc-blende lattice, and its supply is concentrated in China.
- name: Arsenic
symbol: As
atoms: 1
atomic_weight: 74.921595
role: The group V element. Arsenic occupies the other sublattice, and it is the main source of the substance's toxicity.
risk_groups:
- title: For people
level: 2
verdict: Hazardous, carcinogenic
lead: PubChem's GHS entry for GaAs (CAS 1303-00-0) carries carcinogen, reproductive and organ-damage hazard statements, and its toxicity is attributed to the arsenic it contains.
points:
- label: GHS statements
line: H350 (may cause cancer), H360F (may damage fertility) and H372 (causes damage to organs through prolonged or repeated exposure), H350 and H372 each in 88.4% of the company reports and H360 in 50.9%, with 6.2% (7 of 112) reporting no hazard.
- label: Exposure limits
line: NIOSH gives a 15-minute ceiling for inorganic arsenic compounds, OSHA an 8-hour limit as As, and ACGIH lists arsenic and inorganic compounds as A1, a confirmed human carcinogen (see the mitigations entry for the figures).
- title: If it fails
level: 1
verdict: Dust and acid release arsine
lead: Reactions with steam, acids and acid fumes can release arsine, a highly toxic gas.
points:
- label: Arsine
line: PubChem says GaAs can react with steam, acids and acid fumes to evolve the deadly poisonous arsine, and that molten GaAs attacks quartz.
- title: Handling and storage
level: 1
verdict: Keep away from acids and steam
lead: The sources read give storage advice for arsenic compounds generally, which applies to GaAs.
points:
- label: Storage
line: 'PubChem''s advice for inorganic arsenic compounds: store in a well-ventilated area away from food and combustible materials, and protect the container from physical damage.'
why: Gallium arsenide is the compound semiconductor used in multijunction space solar cells and in RF power amplifiers for cellular handsets. The sources read give a band gap of 1.424 eV at 300 K, electron mobility up to 8500 cm2/(V·s), and a melting point of 1238 to 1240 °C. Its arsenic content sets the hazard profile.
uses:
- where: Space solar cells
line: Spectrolab's space solar cells use a GaInP/GaAs/Ge multijunction design, and the paper reports efficiencies of 21.5% (dual junction, 1997), 25.1% (triple junction) and over 28.3% (ultra-triple junction, AM0). It states that the design powers GEO missions up to a possible 30 kW on a single satellite.
- where: Cellular handset RF amplifiers
line: USGS says GaAs power amplifiers are used in cellular handsets, and that silicon CMOS power amplifiers compete with them in midtier 3G handsets.
- where: Optoelectronics and defence
line: USGS lists GaAs as the material for compound semiconductor wafers used in integrated circuits and optoelectronic devices, including laser diodes, LEDs, photodetectors and solar cells, and says GaAs and GaN ICs have no effective substitutes in many defence applications.
can_do:
- label: Carry electrons fast
value: '8500'
benchmark: electron_mobility
line: Electron drift mobility is 8500 cm2/(V·s) at 300 K in eesemi's table, which lists a lower value for silicon in the same table.
- label: Absorb and emit at a wide band gap
value: '1.424'
benchmark: bandgap
line: The band gap is 1.424 eV at 300 K in two sources, which sits above silicon's value in the same table and suits photon emission and multijunction cells.
- label: Hold up in orbit, with a cost
value: '30'
benchmark: damage_coefficient_ratio
line: At 150 keV the maximum-power damage coefficient is 30 times silicon's. The study still judged GaAs cells to perform well in proton-dominated orbits.
compare: Gallium arsenide has higher electron mobility and a wider band gap than silicon at 300 K, and a lower melting point and thermal conductivity. Under low-energy proton irradiation the 1984 JPL study found GaAs cells lost much more power than silicon cells, while the authors judged GaAs cells to perform well in proton-dominated orbits.
compare_rows:
- scope: material
label: Electron mobility at 300 K
benchmark: electron_mobility
- scope: material
label: Band gap at 300 K
benchmark: bandgap
- scope: material
label: Thermal conductivity at 300 K
benchmark: thermal_conductivity
handling:
- 'label: Dust and fumes line: Treat GaAs as a carcinogen-class material: keep dust down, use local exhaust ventilation, and use the exposure limits above. PubChem''s advice for arsenic compounds is to remove dust and ventilate, with positive-pressure breathing apparatus for firefighting.'
- 'label: Keep away from acids line: Do not expose GaAs to steam, acids or acid fumes, which can release arsine.'
good_for:
- 'label: High-efficiency space solar cells line: The GaInP/GaAs/Ge multijunction design reached 25.1% efficiency for the triple junction and over 28.3% for the ultra-triple junction, and the paper says it powers GEO satellites.'
- 'label: High electron mobility devices line: The 8500 cm2/(V·s) electron mobility and 1.424 eV band gap make GaAs a standard choice for RF power amplifiers and optoelectronic devices, as USGS describes.'
watch_out:
- 'label: Arsenic content line: GHS classes GaAs as carcinogenic and toxic to reproduction, and the arsenic it contains is the cause, so handling is controlled.'
- 'label: Radiation in orbit line: The JPL study found GaAs cells lost 30% of their short-circuit current and about 40% of maximum power under 50 keV protons, and it reported damage coefficients 30 times silicon''s at 150 keV.'
- 'label: Supply concentration line: China produced 99% of primary low-purity gallium and supplied more than 90% of US arsenic metal imports, and its export controls on gallium, first imposed in the recent past and partly lifted, have affected US supply (USGS).'
verdict: Gallium arsenide is well documented. Its band gap, mobility, density and melting point agree across two or more sources, and its space cell efficiencies come from a manufacturer. Its hazard data are from PubChem and its radiation data from a 1984 study, so both are dated or secondary. Supply is concentrated in China.
corrosion:
- environment: Moist air at room temperature
headline: Stable in dry air and tarnishes in moist air (PubChem)
effect: PubChem's stability entry says GaAs is stable in dry air and tarnishes in moist air. It is insoluble in water.
rating: low
conditions:
exposure: moist air, duration and temperature not stated in the entry
source: pubchem-gaas
where: Safety and Hazards > Stability and Reactivity > Air and Water Reactions
- environment: Steam, acids and acid fumes
headline: Can release arsine, and cold concentrated hydrochloric acid attacks it
effect: PubChem says GaAs reacts with steam, acids and acid fumes to evolve arsine. It is attacked by cold concentrated hydrochloric acid and readily attacked by the halogens.
rating: severe
conditions:
exposure: contact with steam or acids, concentration not stated
source: pubchem-gaas
where: Safety and Hazards > Stability and Reactivity > Reactivity Profile and Hazardous Reactivities
- environment: Proton radiation in orbit
headline: Power loss under 50 keV protons; silicon cells did not lose short-circuit current in the same study
effect: Under 50 keV protons GaAs cells lost 30% of their short-circuit current, 10% of open-circuit voltage and about 40% of maximum power. The study notes silicon cells did not lose short-circuit current at low proton energy.
rating: severe
conditions:
particle: protons, 50 keV
cell: LPE p/n GaAs solar cells
source: nasa-jpl-84-61
where: Discussion of GaAs results, 50 keV proton bombardment paragraph
supply:
- subject: Gallium
abundance: Gallium occurs in very small concentrations in other metal ores. The average gallium content of bauxite is 50 parts per million, and most gallium is recovered from bauxite processing (USGS)
producers:
- country: China
share_percent: 99
year: 2025
critical_lists: []
recycling: New scrap from GaAs device manufacture was reprocessed to recover high-purity gallium at one New York facility. No old scrap was recycled (USGS 2026).
source: usgs-gallium
where: Gallium MCS 2026, World Low-Purity Production, Events, Trends and Issues, and Recycling sections
- subject: Gallium arsenide wafers
abundance: US imports of GaAs wafers were estimated at 110,000 kg gross weight in 2025, with a value of about 120 million dollars (USGS 2026)
producers: []
critical_lists: []
recycling: Substantial quantities of new scrap from GaAs device manufacture were reprocessed (USGS 2026).
source: usgs-gallium
where: Gallium MCS 2026, Salient Statistics and Domestic Production and Use sections
- subject: Arsenic
abundance: Arsenic is obtained mainly from copper, gold and lead smelter flue dust, and from roasting of ores (USGS 2026). World reserves are estimated at more than 20 times world production. China supplied 95% of US arsenic metal imports in 2021 to 2024, which is an import share, not a producer share.
producers: []
critical_lists: []
recycling: Arsenic metal was contained in new scrap recycled during GaAs semiconductor manufacturing (USGS 2026).
source: usgs-arsenic
where: Arsenic MCS 2026, Import Sources (2021 to 2024, arsenic metal) and World Resources sections
uses:
- application: solar-arrays
device: Triple-junction space solar cell (GaInP/GaAs/Ge)
example: Spectrolab reports 25.1% efficiency for its triple junction and over 28.3% for its ultra-triple junction, and says the design powers GEO missions up to a possible 30 kW on a single satellite.
source: spectrolab-nasa
where: Introduction, paragraphs on the Triple Junction and Ultra-Triple Junction products
- application: electronics-and-chips
device: Power amplifier in cellular handsets
example: USGS says silicon CMOS power amplifiers compete with GaAs power amplifiers in midtier 3G cellular handsets, which means GaAs power amplifiers are used in such handsets.
source: usgs-gallium
where: Substitutes section
- application: optics-and-cameras
device: Laser diodes, LEDs and photodetectors
example: USGS lists GaAs wafers as the substrate for integrated circuits and optoelectronic devices, including laser diodes, LEDs, photodetectors and solar cells.
source: usgs-gallium
where: Domestic Production and Use section
risks:
hazards:
- text: 'PubChem GHS for GaAs: H350 (may cause cancer), H360F (may damage fertility) and H372 (causes damage to organs through prolonged or repeated exposure), H350 and H372 in 88.4% of company reports and H360 in 50.9%, with 6.2% (7 of 112) not meeting GHS criteria.'
ghs:
- H350
- H360F
- H372
source: pubchem-gaas
where: Safety and Hazards > Hazards Identification > GHS Classification (CID 14770)
- text: When heated to decomposition, GaAs emits very toxic fumes of arsenic (NTP, 1992, as quoted by PubChem).
ghs: []
source: pubchem-gaas
where: Safety and Hazards > Hazards Identification > Health Hazards
failure_risks:
- mode: Arsine formation
trigger: Contact with steam, acids or acid fumes
consequence: PubChem says GaAs can evolve the deadly poisonous gas arsine.
severity: high
source: pubchem-gaas
where: Stability and Reactivity > Hazardous Reactivities and Incompatibilities
side_effects: []
handling:
- text: Store under ambient temperatures in a well-ventilated area away from food and combustible materials, and protect containers from physical damage (PubChem, inorganic arsenic compounds).
source: pubchem-gaas
where: Handling and Storage > Storage Conditions
mitigations:
- text: 'Use local exhaust ventilation and, where the arsenic exposure limit may be exceeded, respiratory protection (PubChem, arsenic compounds). Limits as printed: NIOSH recommended 15-minute ceiling 0.002 mg/m3 (as As); OSHA permissible exposure 8-hour TWA 0.01 mg/m3 (as As); ACGIH TLV-TWA 0.0003 mg/m3, respirable fraction.'
source: pubchem-gaas
where: Exposure Control and Personal Protection > Personal Protective Equipment
media: []
documents:
- title: PubChem compound record for gallium arsenide, CID 14770 (CAS 1303-00-0)
type: database
url: https://pubchem.ncbi.nlm.nih.gov/compound/14770
year: 2026
- title: 'USGS Mineral Commodity Summaries 2026: Gallium'
type: report
url: https://pubs.usgs.gov/periodicals/mcs2026/mcs2026-gallium.pdf
year: 2026
- title: 'USGS Mineral Commodity Summaries 2026: Arsenic'
type: report
url: https://pubs.usgs.gov/periodicals/mcs2026/mcs2026-arsenic.pdf
year: 2026
- title: 'JPL Publication 84-61: Radiation Effects in Silicon and Gallium Arsenide Solar Cells Using Isotropic and Normally Incident Radiation (NASA NTRS 19840026722)'
type: report
url: https://ntrs.nasa.gov/citations/19840026722
year: 1984
- title: Multijunction Solar Cell Development and Production at Spectrolab (NASA NTRS 20090022292)
type: paper
url: https://ntrs.nasa.gov/citations/20090022292
year: 2018
- title: Basic Parameters of Gallium Arsenide (GaAs), Ioffe Institute, Physical Properties of Semiconductors
type: database
url: http://www.ioffe.ru/SVA/NSM/Semicond/GaAs/basic.html
- title: NIST atomic weights and isotopic compositions, standard atomic weights for Ga and As
type: database
url: https://physics.nist.gov/cgi-bin/Compositions/stand_alone.pl?ele=Ga
- title: EE Semi, Properties of Silicon (Si), Germanium (Ge), and Gallium Arsenide (GaAs) at 300 deg K
type: database
url: https://www.eesemi.com/sigegaas.htm
gaps:
- Lattice constant, band gap, electron and hole mobility, intrinsic carrier concentration and breakdown field have no canonical name in spores/property-canon.yaml. They use snake_case names, as silicon.yaml does.
- Direct or indirect band gap is not stated as a word in the sources read. The Ioffe band structure page lists the Gamma, L and X valleys only.
- Critical-mineral status of gallium and arsenic was not read in this run (USGS 2025 critical minerals list not fetched).
- Industrial process for GaAs crystal growth (Czochralski, liquid encapsulated, VGF) was not read in this run, so the recipe gives composition only.
- Safety data sheet for GaAs powder was not read in this run; hazards come from the PubChem GHS entry and the arsenic exposure limits.
- Proton fluence for the 50 keV loss figures and the orbit-level degradation results were not extracted from the JPL study in this run.
- Radiation data are from a 1984 study of early LPE cells, not from current multijunction cells.
- The Ioffe thermal conductivity (0.55 W/(cm·°C)) has no temperature stated, and the eesemi value (0.46) is at 300 K. Both are kept, with conditions.
sources:
ioffe-basic:
title: Ioffe Institute, Basic Parameters of Gallium Arsenide (GaAs), Basic Parameters at 300 K
url: http://www.ioffe.ru/SVA/NSM/Semicond/GaAs/basic.html
kind: web
license: page content, cited as published
ioffe-bandstr:
title: Ioffe Institute, Band structure and carrier concentration of GaAs
url: http://www.ioffe.ru/SVA/NSM/Semicond/GaAs/bandstr.html
kind: web
license: page content, cited as published
ioffe-thermal:
title: Ioffe Institute, Thermal properties of GaAs
url: http://www.ioffe.ru/SVA/NSM/Semicond/GaAs/thermal.html
kind: web
license: page content, cited as published
ioffe-electric:
title: Ioffe Institute, Electrical properties of GaAs
url: http://www.ioffe.ru/SVA/NSM/Semicond/GaAs/electric.html
kind: web
license: page content, cited as published
ioffe-mechanic:
title: Ioffe Institute, Mechanical properties, elastic constants, lattice vibrations of GaAs
url: http://www.ioffe.ru/SVA/NSM/Semicond/GaAs/mechanic.html
kind: web
license: page content, cited as published
ioffe-optic:
title: Ioffe Institute, Optical properties of GaAs
url: http://www.ioffe.ru/SVA/NSM/Semicond/GaAs/optic.html
kind: web
license: page content, cited as published
eesemi:
title: EE Semi, Properties of Silicon (Si), Germanium (Ge), and Gallium Arsenide (GaAs) at 300 deg K
url: https://www.eesemi.com/sigegaas.htm
kind: web
license: page content, cited as published
pubchem-gaas:
title: PubChem, Gallium arsenide, CID 14770 (CAS 1303-00-0), Safety and Hazards and Chemical and Physical Properties
url: https://pubchem.ncbi.nlm.nih.gov/compound/14770
kind: database
license: PubChem terms of use, cited as published
usgs-gallium:
title: 'USGS Mineral Commodity Summaries, February 2026: Gallium'
url: https://pubs.usgs.gov/periodicals/mcs2026/mcs2026-gallium.pdf
kind: report
license: public domain (USGS)
usgs-arsenic:
title: 'USGS Mineral Commodity Summaries, February 2026: Arsenic'
url: https://pubs.usgs.gov/periodicals/mcs2026/mcs2026-arsenic.pdf
kind: report
license: public domain (USGS)
nasa-jpl-84-61:
title: JPL Publication 84-61, Radiation Effects in Silicon and Gallium Arsenide Solar Cells Using Isotropic and Normally Incident Radiation (Anspaugh and Downing, 1984)
url: https://ntrs.nasa.gov/citations/19840026722
kind: report
license: NASA NTRS, public use
spectrolab-nasa:
title: Fetzer et al., Multijunction Solar Cell Development and Production at Spectrolab (NASA NTRS 20090022292)
url: https://ntrs.nasa.gov/citations/20090022292
kind: paper
license: NASA NTRS, public use
nist-atomic-weights:
title: NIST, Atomic Weights and Isotopic Compositions for Gallium and Arsenic (standard atomic weights)
url: https://physics.nist.gov/cgi-bin/Compositions/stand_alone.pl?ele=Ga
kind: database
license: public domain (NIST)
license: CC-BY-4.0
updated: '2026-10-19'
review:
status: draft
method: assistant
checked_values: 34
note: Written by an AI assistant on 2026-10-19 from pages fetched in this run. Not yet re-checked against the cited sources.
References
Every number above carries a reference number. Click one to see the source and where in it the value comes from.