Indium tin oxide (ITO) coating ITO

Mixed oxide of indium and tin, 74% In, 8% Sn and 18% O by weight (Wikipedia). The Angstrom Sciences SDS names the product In2O3 SnO2. The Sigma-Aldrich SDS for an ITO-coated PET film lists diindium trioxide (CAS 1312-43-2, 90 to 100 %) and tin(IV) oxide (CAS 18282-10-5, 10 to 30 %).

Indium tin oxide (ITO) is a mixed oxide of indium and tin, deposited as a thin film that conducts electricity and stays optically transparent.

10 sources · Updated 2026-11-01 · CC BY 4.0

Evidence level

5 of 5

Flown or field-proven

Conduct and stay clear

70 to 100 ohm/square at 70 nm

Survive low Earth orbit

9.04e-28 to 3.19e-23 cm3/atom

Heat cycles

16 % sheet resistance rise at 250 C

Reflect and absorb sunlight

0.423 solar absorptance (control)

Recipe, share of the weight

  • In 74%Indium
  • Sn 8%Tin
  • O 18%Oxygen

Best for

Transparent films that must conduct enough to bleed off static charge while staying optically clear, such as thermal-control sheets in low Earth orbit

Weakest at

Heat and flight stability of sheet resistance: 16 % rise after three 12-hour cycles at 250 C, and widely scattered readings on silver-Teflon sheets

Risk at a glance

  • People Low. Irritant codes; no ITO-specific toxicity
  • If it fails Moderate. Sheet resistance rises with heat
  • Corrosion Moderate. Lab plasma tests found ITO-MgF2 films with low magnesium fluoride content not durable to atomic oxygen, while high-content films were durable.

Quick facts: ITO

Key properties of ITO
PropertyValueBasis
Density6.8 g/cm³1 sourced value
Electrical resistivity0.000001 Ω·m1 sourced value
Maximum service temperature300 °C1 sourced value

What is the density of Indium tin oxide (ITO) coating?

Indium tin oxide (ITO) coating has a density of 6.8 g/cm³. The source and test conditions are listed in the properties table on this page.

What is the maximum service temperature of Indium tin oxide (ITO) coating?

Indium tin oxide (ITO) coating has a maximum service temperature of 300 °C. The source and test conditions are listed in the properties table on this page.

What is Indium tin oxide (ITO) coating used for?

Uses recorded in the sources include Spacecraft thermal-control sheets (ITO on Kapton HN/Al and on silver-Teflon); Conductive protective coatings for space solar cells (research); Transparent electrodes in flat-panel displays.

Why it exists

Indium tin oxide (ITO) is a mixed oxide of indium and tin, used as a thin film that is both electrically conductive and optically transparent. NASA coated flexible thermal-control sheets with ITO because a spacecraft in low Earth orbit builds up electrostatic charge that can cause arcing (NASA/TM-20240002413, Introduction). The supplier data page lists a sheet resistance of 70 to 100 ohm/square for a 70 nm ITO film on unpolished soda-lime glass, with nominal transmittance greater than 88 %.

Where it's used

Spacecraft thermal-control sheets

NASA flew six ITO-coated Kapton HN and silver-Teflon sheets on the MISSE-9 mission, for 0.77 years in ram and 0.54 years in wake and zenith. The authors found the samples not significantly damaged and suitable for thermal-control sheet use.

Solar-cell coverglass coatings

A 1994 NASA study says a conductive protective coating is essential for solar cells in space, and tested ITO films with magnesium fluoride against atomic oxygen. Those were ITO-MgF2 films, not pure ITO.

Flat-panel displays

The USGS says ITO thin-film coatings are mainly used as electrical conductors in flat-panel displays, most commonly liquid crystal displays (LCDs), and that ITO accounts for most global indium consumption.

Recipe

Mixed oxide of indium and tin, 74% In, 8% Sn and 18% O by weight (Wikipedia). The Angstrom Sciences SDS names the product In2O3 SnO2. The Sigma-Aldrich SDS for an ITO-coated PET film lists diindium trioxide (CAS 1312-43-2, 90 to 100 %) and tin(IV) oxide (CAS 18282-10-5, 10 to 30 %).

Indium tin oxide is a mixed oxide of indium and tin (Wikipedia). Supplier and NASA sources describe thin films deposited by sputtering, and the MISSE-9 flight coatings were about 10 nm thick (NASA/TM-20240002413, Materials section).

What ITO is made of
IngredientShare of the weightWhat it does
Indium In 74% Main metal, 74 % by weight (Wikipedia)
Tin Sn 8% Tin component, 8 % by weight (Wikipedia)
Oxygen O 18% Oxygen, 18 % by weight (Wikipedia)

Weight shares are as printed in the sources.

What it can do

Conduct and stay clear

70 to 100 ohm/square at 70 nm

measured

On unpolished soda-lime glass, a 70 nm ITO film is listed at 70 to 100 ohm/square, with greater than 88 % nominal transmittance (supplier data page).

Survive low Earth orbit

9.04e-28 to 3.19e-23 cm3/atom

measured

Atomic oxygen erosion yields for the six MISSE-9 flight samples ranged from 9.04e-28 to 3.19e-23 cm3/atom, and NASA called all of them very low.

Heat cycles

16 % sheet resistance rise at 250 C

measured

After three 12-hour cycles at 250 C, the supplier data show a 16 % rise in sheet resistance. At 210 C the rise is 4 %, and the maximum recommended temperature is 300 C.

Reflect and absorb sunlight

0.423 solar absorptance (control)

measured

The unflown control ITO on Kapton HN/Al has an AM0 solar absorptance of 0.423 and a total reflectance of 0.577. The largest absorptance increase on any flight sample was 0.002 (zenith).

How it compares

The USGS names antimony tin oxide, carbon nanotube coatings, PEDOT, copper or silver nanowires, graphene and zinc oxide nanopowder as substitutes for ITO in some uses. The sources opened here give no property values for those alternatives, so this profile does not rank them against ITO; read the rows as ITO values only.

The same measurements for each material, so you can compare them. Each row names the key condition under the value; the full conditions and methods are in the numbered notes under Technical details.

Benchmarks
MeasurementITO
Physical and electrical
Electrical resistivity of ITO (approximate)1×10^-4 Ω·cm13
Density of ITO film used in the erosion-yield calculation6.8 g/cm³15
Other measurements
Sheet resistance, 70 nm ITO on unpolished soda-lime glassRange printed in a supplier data table70 to 100 ohm/square1
Nominal transmittance, 70 nm ITO on unpolished soda-lime glass> 88 %2
Sheet resistance, 350 nm ITO on unpolished soda-lime glassRange printed in a supplier data table15 to 30 ohm/square3
Nominal transmittance, 350 nm ITO on unpolished soda-lime glass> 85 %4
Sheet resistance, 700 nm ITO on unpolished soda-lime glassRange printed in a supplier data table8 to 12 ohm/square5
Nominal transmittance, 700 nm ITO on unpolished soda-lime glass> 83 %6
Sheet resistance rise after heating at 250 C, three 12-hour cycles16 %7
Sheet resistance rise after heating at 210 C, three 12-hour cycles4 %8
Sheet resistance rise after heating at 160 C, three 12-hour cycles2.5 %9
Maximum recommended temperature for ITO coatingsValue printed on a supplier data page300 °C
Refractive index of sputtered ITO coating at 600 nm2 -10
Refractive index of sputtered ITO coating at 400 nm2.15 -11
Band gap of ITO (approximate)4 eV12
Optical transmittance of a thin ITO film (lower bound)Lower bound printed in an encyclopedia article> 80 %
Transmittance of sputtered ITO-MgF2 films (variant with magnesium fluoride added)75 to 86 %14
Sheet resistance of ITO on Kapton HN/Al after ram exposure (MISSE-9 flight)10820 ohm/square16
Atomic oxygen erosion yield, M9R-S5 ITO/Kapton HN/Al, ram6.72×10^-27 cm³/atom17
Atomic oxygen erosion yield, M9R-S6 ITO/FEP/Ag/Inconel, ram9.04×10^-28 cm³/atom18
Atomic oxygen erosion yield, M9W-S1 ITO/Kapton HN/Al, wake3.19×10^-23 cm³/atom19
Atomic oxygen erosion yield, M9W-S2 ITO/FEP/Ag/Inconel, wake2×10^-24 cm³/atom20
Atomic oxygen erosion yield, M9W-S3 ITO/FEP/Ag/Inconel, wake1.74×10^-24 cm³/atom21
Atomic oxygen erosion yield, M9Z-S5 ITO/FEP/Ag/Inconel, zenith6.83×10^-27 cm³/atom22
AM0 solar absorptance, unflown control ITO/Kapton HN/Al0.423 -23
AM0 solar absorptance, unflown control ITO/FEP/Ag/Inconel0.098 -24
AM0 total reflectance, unflown control ITO/Kapton HN/Al0.577 -25
AM0 total reflectance, unflown control ITO/FEP/Ag/Inconel0.902 -26
Largest solar absorptance increase on a MISSE-9 flight sample (zenith)Change printed in Table 5 and in Section 5.30.002 -27

Why choose it, and why not

Good for

  • Transparent conductive films on flexible or glass substrates: 70 to 100 ohm/square at 70 nm, with greater than 88 % nominal transmittance.
  • Thermal-control sheets in low Earth orbit: the MISSE-9 flight samples were not significantly damaged, with erosion yields from 9.04e-28 to 3.19e-23 cm3/atom.
  • Displays: the USGS identifies flat-panel LCDs as the main use of ITO coatings.

Watch out for

  • Heat drift: sheet resistance rose 16 % after three 12-hour cycles at 250 C.
  • Flight scatter: readings on silver-Teflon sheets ranged widely, with some above 370,000 ohm/square, and NASA called for recalibrated measurements.
  • Indium supply: China produces 70 % of world indium, and China added indium to its export restrictions in February 2025 (USGS).
  • Component hazards: the indium oxide component is reported with H372 in some notifications, and the film products carry H335.

ITO is a transparent conductor that flew on spacecraft thermal sheets with very low erosion yields and no significant damage in the NASA MISSE-9 test. Its sheet resistance rises with heat (16 % at 250 C) and was scattered on silver-Teflon samples. Its supply depends on indium, which is on the USGS 2025 critical list. This profile has no ground or flight data on humidity, radiation dose or outgassing, and no measured melting point.

Technical details

For scientists and researchers. Everything above comes from the record below: every number with its method, its conditions and its source.

Notes

The method, full conditions and any caveat for the numbered rows above.

Notes for the numbered rows
#MeasurementMethodConditionsCaveat
1Sheet resistance, 70 nm ITO on unpolished soda-lime glass—substrate float soda-lime glass microscope slide, unpolishedfilm thickness 70 nm (table column ITO thickness, printed as 70 NM)temperature not stated—
2Nominal transmittance, 70 nm ITO on unpolished soda-lime glassNominal figure printed as greater than 88% in a supplier data tablesubstrate float soda-lime glass microscope slide, unpolishedfilm thickness 70 nmwavelength not statedNominal figure for the coated slide; the page gives no wavelength.
3Sheet resistance, 350 nm ITO on unpolished soda-lime glass—substrate float soda-lime glass microscope slide, unpolishedfilm thickness 350 nmtemperature not stated—
4Nominal transmittance, 350 nm ITO on unpolished soda-lime glassNominal figure printed as greater than 85% in a supplier data tablesubstrate float soda-lime glass microscope slide, unpolishedfilm thickness 350 nmwavelength not statedNominal figure; the page gives no wavelength.
5Sheet resistance, 700 nm ITO on unpolished soda-lime glass—substrate float soda-lime glass microscope slide, unpolishedfilm thickness 700 nmtemperature not stated—
6Nominal transmittance, 700 nm ITO on unpolished soda-lime glassNominal figure printed as greater than 83% in a supplier data tablesubstrate float soda-lime glass microscope slide, unpolishedfilm thickness 700 nmwavelength not statedNominal figure; the page gives no wavelength.
7Sheet resistance rise after heating at 250 C, three 12-hour cyclesPercentage change printed in the High Temperature Applications test table of a supplier data pagetemperature 250 Ccycles 3 cycles of 12 hourssubstrate not named on the page—
8Sheet resistance rise after heating at 210 C, three 12-hour cyclesPercentage change printed in the High Temperature Applications test table of a supplier data pagetemperature 210 Ccycles 3 cycles of 12 hourssubstrate not named on the page—
9Sheet resistance rise after heating at 160 C, three 12-hour cyclesPercentage change printed in the High Temperature Applications test table of a supplier data pagetemperature 160 Ccycles 3 cycles of 12 hourssubstrate not named on the page—
10Refractive index of sputtered ITO coating at 600 nmValue printed in a refractive index table on a supplier data pagewavelength 600 nmcoating sputtered ITO coatingextinction coefficient 0.0065 at 600 nm (printed in the same table)—
11Refractive index of sputtered ITO coating at 400 nmValue printed in a refractive index table on a supplier data pagewavelength 400 nmcoating sputtered ITO coatingextinction coefficient 0.025 at 400 nm (printed in the same table)—
12Band gap of ITO (approximate)Approximate figure printed in an encyclopedia article, with no measurement method givenbasis around 4 eV, as printed in an encyclopedia articlematerial ITO thin filmThe article gives only an approximate figure, around 4 eV.
13Electrical resistivity of ITO (approximate)Approximate figure printed in an encyclopedia article, with no measurement method givenbasis printed as approximately 10 to the power minus 4 ohm cm in an encyclopedia articlefilm not statedApproximate figure only; the article gives no thickness or temperature.
14Transmittance of sputtered ITO-MgF2 films (variant with magnesium fluoride added)Range printed in the abstract of a 1994 NASA conference papermaterial sputtered ITO with magnesium fluoride added (ITO-MgF2, not pure ITO)wavelength not stated in the abstractA related coating with magnesium fluoride, not pure ITO; included because the same study tested ITO at several MgF2 contents.
15Density of ITO film used in the erosion-yield calculationValue printed in a NASA table that the authors use in the erosion-yield calculationbasis ITO density column of Table 6, cited to reference 10 (Journal Vac. Sci. Tech A 19:5, 2001)film ITO on Kapton HN/Al or FEP/Ag/Inconel sheet—
16Sheet resistance of ITO on Kapton HN/Al after ram exposure (MISSE-9 flight)Average printed for the flight sample in Table 4 and in the abstractsample M9R-S5 flight, ITO coated Kapton HN/aluminum, ram orientationexposure 0.77 years direct space exposure (ram)film thickness approximately 10 nmmeasurement four-point probe; the report says absolute accuracy is unknownThe unexposed backup average for the same material is 5,230 ohm/square in Table 4; the report says the flight value doubled.
17Atomic oxygen erosion yield, M9R-S5 ITO/Kapton HN/Al, ramErosion yield calculated by the authors from dehydrated mass loss, exposed area, density and fluence (equation 1)sample M9R-S5 F, ITO/Kapton HN/Al, 2 milflight direction ramatomic oxygen fluence 3.44E+20 atoms/cm2mass loss 0.000069 gexposed area 4.414 cm2density used 6.8 g/cm3—
18Atomic oxygen erosion yield, M9R-S6 ITO/FEP/Ag/Inconel, ramErosion yield calculated by the authors from dehydrated mass loss, exposed area, density and fluence (equation 1)sample M9R-S6 F, ITO/FEP/Ag/Inconel, 5 milflight direction ramatomic oxygen fluence 3.44E+20 atoms/cm2mass loss 0.000009 gexposed area 4.420 cm2density used 6.8 g/cm3Mass loss is just above the balance error range, per the report.
19Atomic oxygen erosion yield, M9W-S1 ITO/Kapton HN/Al, wakeErosion yield calculated by the authors from dehydrated mass loss, exposed area, density and fluence (equation 1)sample M9W-S1 F, ITO/Kapton HN/Al, 2 milflight direction wakeatomic oxygen fluence 4.46E+16 atoms/cm2mass loss 0.000043 gexposed area 4.406 cm2density used 6.8 g/cm3The largest of the six flight values; the report still calls all six very low.
20Atomic oxygen erosion yield, M9W-S2 ITO/FEP/Ag/Inconel, wakeErosion yield calculated by the authors from dehydrated mass loss, exposed area, density and fluence (equation 1)sample M9W-S2 F, ITO/FEP/Ag/Inconel, 5 milflight direction wakeatomic oxygen fluence 4.46E+16 atoms/cm2mass loss 0.000003 gexposed area 4.387 cm2density used 6.8 g/cm3Mass loss is within the balance error (plus or minus 0.005 mg), per the report.
21Atomic oxygen erosion yield, M9W-S3 ITO/FEP/Ag/Inconel, wakeErosion yield calculated by the authors from dehydrated mass loss, exposed area, density and fluence (equation 1)sample M9W-S3 F, ITO/FEP/Ag/Inconel, 5 milflight direction wakeatomic oxygen fluence 4.46E+16 atoms/cm2mass loss 0.000002 gexposed area 4.416 cm2density used 6.8 g/cm3Mass loss is within the balance error (plus or minus 0.005 mg), per the report.
22Atomic oxygen erosion yield, M9Z-S5 ITO/FEP/Ag/Inconel, zenithErosion yield calculated by the authors from dehydrated mass loss, exposed area, density and fluence (equation 1)sample M9Z-S5 F, ITO/FEP/Ag/Inconel, 5 milflight direction zenithatomic oxygen fluence 3.19E+18 atoms/cm2mass loss 0.000001 gexposed area 4.501 cm2density used 6.8 g/cm3—
23AM0 solar absorptance, unflown control ITO/Kapton HN/AlIntegrated value printed in Table 5 (control row)material ITO/Kapton HN/Al control (backup) sample M9R-S5 Bspectrum AM0 integrated, 250 to 2500 nmmethod Cary 5000 with integrating sphere—
24AM0 solar absorptance, unflown control ITO/FEP/Ag/InconelIntegrated value printed in Table 5 (control row)material ITO/FEP/Ag/Inconel control (backup) sample M9W-S2 Bspectrum AM0 integrated, 250 to 2500 nmmethod Cary 5000 with integrating sphere—
25AM0 total reflectance, unflown control ITO/Kapton HN/AlIntegrated value printed in Table 5 (control row)material ITO/Kapton HN/Al control (backup) sample M9R-S5 Bspectrum AM0 integrated, 250 to 2500 nm—
26AM0 total reflectance, unflown control ITO/FEP/Ag/InconelIntegrated value printed in Table 5 (control row)material ITO/FEP/Ag/Inconel control (backup) sample M9W-S2 Bspectrum AM0 integrated, 250 to 2500 nm—
27Largest solar absorptance increase on a MISSE-9 flight sample (zenith)—sample M9Z-S5 F, ITO/FEP/Ag/Inconel, zenithexposure 0.54 years direct space exposuremeasurement error within error of the Cary data, per the report—

Corrosion and compatibility

What happens when it meets other materials and environments.

Corrosion and compatibility
EnvironmentConcernWhat happens
Atomic oxygen in low Earth orbit (ram, wake and zenith flight orientations) low In the MISSE-9 flight, ITO sheets were not significantly damaged by atomic oxygen, and their erosion yields were very low.1
Atomic oxygen plasma in the laboratory (ITO-MgF2 films) moderate Lab plasma tests found ITO-MgF2 films with low magnesium fluoride content not durable to atomic oxygen, while high-content films were durable.2
Heating in air or vacuum (laboratory cycles, 3 x 12 hours) moderate Sheet resistance rises with temperature: 2.5 % at 160 C, 4 % at 210 C and 16 % at 250 C after three 12-hour cycles.3
Ultraviolet light after LEO flight low After flight, the ITO on Kapton HN/Al did not change under UV light, but the ITO on silver-Teflon fluoresced slightly more with atomic oxygen exposure.4
Corrosion details
#EnvironmentDetailsTest conditions
1 Atomic oxygen in low Earth orbit (ram, wake and zenith flight orientations) NASA flew six ITO-coated sheets for 0.77 years (ram) and 0.54 years (wake and zenith). The report says the samples were not significantly damaged, the erosion yields were very low, and solar absorptance changed very little. The sheet resistance of the ITO on Kapton HN/Al doubled after ram exposure, which NASA traces to atomic oxygen. exposure MISSE-9 PCE-1 flight, ISS, 2018 to 2020atomic oxygen fluence 3.44E+20 atoms/cm2 (ram); 4.46E+16 (wake); 3.19E+18 (zenith)coating thickness approximately 10 nm
2 Atomic oxygen plasma in the laboratory (ITO-MgF2 films) A 1994 NASA study of sputtered ITO with magnesium fluoride, along with ZnO and AZO, found that the high MgF2 content ITO-MgF2 films were durable to atomic oxygen plasma, while the low MgF2 content films were not. This is a ground plasma test, not a flight result, and it covers ITO with MgF2 added. test atomic oxygen plasma, laboratorymaterial sputtered ITO with varying MgF2 content
3 Heating in air or vacuum (laboratory cycles, 3 x 12 hours) The supplier test table gives the sheet resistance change after three 12-hour cycles at each temperature. The page also gives a maximum recommended temperature of 300 C. The atmosphere and substrate used in the heating test are not named on the page. cycles 3 cycles of 12 hours eachsubstrate not named on the pageatmosphere not stated
4 Ultraviolet light after LEO flight NASA compared flight and control samples under 365 nm UV light. The Kapton HN/Al samples looked the same as their controls. The ITO/FEP/Ag/Inconel samples showed a small amount of fluorescence, which increased with atomic oxygen exposure. Under normal light the differences were minimal. light 365 nm UV source and normal visible lightsamples MISSE-9 flight and control pairs

Risks and side effects

Hazards to people, what happens when a cell overheats, and how the material is handled and stored.

For people

The supplier safety data sheets give hazard codes for ITO films and powders, and for the indium oxide component. The codes differ by product form.

ITO film on PET (supplier SDS)
Sigma-Aldrich's safety data sheet for indium tin oxide coated PET classifies the product as a skin irritant (H315), an eye irritant (H319) and a possible respiratory irritant (H335), with signal word Warning.
ITO powder or pellets (supplier SDS)
Angstrom Sciences' sheet for ITO powder, granules, pellets and sputtering targets lists only H335, may cause respiratory irritation, with signal word Warning. Its exposure limit is 0.1 mg/m3 as indium.
Indium(III) oxide, a component
PubChem reports that 71.2% of company notifications for indium(III) oxide do not meet GHS criteria. Among the rest, codes include H372 (organ damage after prolonged exposure), with signal word Danger. These are data for the oxide, not for ITO films.

If it fails

These failure routes come from the flight test, a heating test and a laboratory plasma test. The space results come from one NASA report on MISSE-9 samples.

Sheet resistance rises in ram orientation
On the MISSE-9 flight, ITO on Kapton HN/Al doubled its sheet resistance after ram exposure, to 10,820 ohm/square. NASA judged that low enough to dissipate static charge.
Heat
The supplier data show sheet resistance rising 16 % after three 12-hour cycles at 250 C, and 4 % at 210 C. The maximum recommended temperature is 300 C.
Silver-Teflon scatter
Sheet resistance readings on ITO/FEP/Ag/Inconel sheets scattered widely, with some flight readings above 370,000 ohm/square. NASA recommended re-measuring all samples with calibrated equipment.
Low MgF2 content
A 1994 NASA test in an oxygen plasma found low-MgF2 ITO-MgF2 films not durable, while high-MgF2 films were durable. This is a laboratory plasma result for the MgF2 variant, not a flight result.

Handling and storage

Dust
Angstrom Sciences says to avoid breathing dust and fume and to vacuum spills with a HEPA filter, without raising dust. Store locked up in a tightly closed container.
Heat limit
Keep films at or below 300 C. Above that the supplier gives no data, and even at 160 C sheet resistance rises 2.5 % in the supplier test.

Test details
The original wording and numbers from the sources, for readers who want them.

Failure risks

Failure risks
FailureTrigger and consequence
Sheet resistance rises after ram exposure in low Earth orbitlow severityRam-facing ITO on Kapton HN/Al, 0.77 years direct exposure on MISSE-9Sheet resistance doubled to 10,820 ohm/square. NASA judged this low enough to dissipate electrostatic charge, and attributes the change to atomic oxygen.
Sheet resistance rises with heatmoderate severityHeating at 250 C for three 12-hour cyclesSheet resistance rose 16 %. At 210 C the rise was 4 %, and at 160 C it was 2.5 %.
Scattered sheet-resistance readings on silver-Teflon sheetsmoderate severityITO on FEP/Ag/Inconel, flight and backup samples, measured by four-point probeReadings varied widely within a sample, and some flight readings were above 370,000 ohm/square. NASA called the measurements inconsistent and recommended re-measuring all samples with calibrated equipment.
Low magnesium fluoride content in ITO-MgF2 filmsmoderate severityAtomic oxygen plasma (laboratory)Low MgF2 content ITO-MgF2 films were not durable to atomic oxygen plasma, while high MgF2 content films were. This is for the MgF2 variant, not pure ITO.

Side effects on surrounding parts

Side effects on surrounding parts
AffectsEffect
Operators handling powders, pellets or sputtering targetsIndium tin oxide dust and fume can irritate the respiratory tract, so the powder, pellets and sputtering targets must be handled to avoid dust formation.

Handling and storage

  • Angstrom Sciences: avoid breathing dust and fume, wash thoroughly after handling, and store in a cool, dry place in a tightly sealed container. Clean spills by vacuuming with a HEPA filter and do not raise dust.
  • Exposure limit: 0.1 mg/m3 as indium (OSHA and ACGIH) per the Angstrom Sciences SDS. The Sigma-Aldrich SDS lists a TWA of 0.1 mg/m3 for diindium trioxide (ACGIH).

Mitigations

  • Keep films at or below 300 C, the supplier's maximum recommended temperature, since sheet resistance rises with heat (2.5 % at 160 C, 4 % at 210 C, 16 % at 250 C).

Supply and geography

How common the raw materials are and where they come from.

Indium (in ITO and other uses)

Top producers (2025)
China 70%, Republic of Korea 16.4%, Japan 5.9%, Canada 3.6%
Critical mineral lists
US: listed
Recycling
USGS: indium is most commonly recovered from ITO scrap in Japan and the Republic of Korea. Quantities recovered from scrap were not available, and there were no readily available recycling or end-use data.
Substitutes
USGS lists antimony tin oxide, carbon nanotube coatings, PEDOT, copper or silver nanowires, graphene and a zinc oxide nanopowder as substitutes for ITO in some uses.

Tin (in the tin oxide and solder components)

Top producers (2025)
China 24.5%, Indonesia 21%, Peru 11.4%, Brazil 9.7%
Critical mineral lists
US: listed
Recycling
USGS: about 17,000 tons of tin from old and new scrap was estimated to have been recycled in 2025.
Substitutes
USGS: aluminum, glass, paper, plastic or tin-free steel substitute for tin in cans and containers.

Updated